In Situ Pulsed Deposition Studies of Ce ( tmhd ) 4 on SrS Surfaces for Thin Film Electroluminescent Flat Panel Display Applications
| Autor: | Denis Endisch, Janice E. Lau, Anna W. Topol, Alain E. Kaloyeros, Gregory G. Peterson, Mark Delarosa, Christopher N. King, Karl W. Barth, Richard T. Tuenge |
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| Rok vydání: | 1998 |
| Předmět: |
Strontium sulfide
Dopant Renewable Energy Sustainability and the Environment Chemistry Nucleation Analytical chemistry Mineralogy chemistry.chemical_element Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry.chemical_compound Cerium X-ray photoelectron spectroscopy Materials Chemistry Electrochemistry Atomic layer epitaxy Metalorganic vapour phase epitaxy Thin film |
| Zdroj: | Journal of The Electrochemical Society. 145:4271-4276 |
| ISSN: | 1945-7111 0013-4651 |
| Popis: | In this paper, results are presented from a systematic investigation which aimed to evaluate the performance and efficiency of tetrakis(2,2,6,6-tetramethyl-3,5-heptadionato)cerium(IV), or Ce(tmhd) 4 , as the cerium dopant source in the atomic layer epitaxy (ALE) of strontium sulfide (SrS) thin films for thin film electroluminescent (TFEL) display applications. For this purpose, in situ growth and characterization studies of the adsorption and associated nucleation mechanisms of Ce(tmhd) 4 on SrS surfaces were performed in a clustered system under tightly controlled ultraclean conditions. The growth experiments were carried out in a specially designed processing chamber under pulsed deposition conditions that emulated the ALE process. The samples were then transferred in situ, without exposure to air, to various characterization chambers where compositional and chemical analyses were readily performed. In particular, chemical evaluation by X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectroscopy showed incomplete decomposition of the Ce(tmhd) 4 molecule with the observation of high carbon levels corresponding to ligands from the precursor. It is believed that these ligands sterically hinder subsequent adsorption and nucleation of the Sr source by poisoning the substrate surface, and therefore require repeated cycles of exposure to pulses of the Sr source and associated reactants to ensure their complete removal. It is thus suggested that the incomplete decomposition of the Ce(tmhd) 4 molecule is the primary cause for its poor efficiency as Ce source precursor, an observation supported by experimental findings from actual ALE manufacturing of SrS:Ce films for TFEL applications. |
| Databáze: | OpenAIRE |
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