Liquid film enhanced laser cleaning
| Autor: | Andrew C. Tam, G. Ayers, W. Ziemlich, Werner Zapka |
|---|---|
| Rok vydání: | 1992 |
| Předmět: |
Materials science
Silicon Explosive material business.industry Evaporation Pulse duration chemistry.chemical_element Condensed Matter Physics Laser Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Pulse (physics) Optics Liquid film chemistry law Optoelectronics Irradiation Electrical and Electronic Engineering business |
| Zdroj: | Microelectronic Engineering. 17:473-478 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/0167-9317(92)90097-b |
| Popis: | ‘Liquid Film Enhanced Laser Cleaning” is a technique to remove particulate contamination from surfaces. A thin liquid film deposited onto the contaminated surface is flood irradiated with a short laser pulse. The resulting sudden evaporation of the liquid film leads to high transient explosive forces, large enough to expel even submicron particles from the surface. For instance 0.1μm alumina particles could efficiently be removed from a silicon surface with KrF excimer laser irradiation of 16 ns pulse length and 120 mJ/cm 2 energy density. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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