Autor: |
G. Hill, F. Ranalli, Jie Bai, Tao Wang, R. J. Airey, Peter J. Parbrook, K. B. Lee |
Rok vydání: |
2009 |
Předmět: |
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Zdroj: |
Journal of Crystal Growth. 311:2857-2859 |
ISSN: |
0022-0248 |
DOI: |
10.1016/j.jcrysgro.2009.01.030 |
Popis: |
The effect of the AIGaN electron blocking layer (EBL) thickness on the electrical and optical properties of 310 nm AIGaN single quantum well (SQW) light-emitting diodes (LEDs) has been investigated. A large ideality factor extracted from the current-voltage (I-V) characteristics indicates that a tunneling mechanism dominates the carrier transport process in the LEDs. The ideality factor decreases with increasing EBL thickness suggesting that deep-level state assisted tunneling is reduced. In addition, the QW emission intensity is enhanced with the introduction of an EBL due to the reduction of electron overflow to the p-type layer. The QW emission intensity is sensitive to the EBL thickness. This is attributed to the reduction of electron tunneling to the p-type layer with an EBL. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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