Autor:	Zeev Zalevsky, Maor Tiferet, Moshe Sinvani
Rok vydání:	2019
Předmět:	Diffusion effect Optics Materials science Silicon chemistry business.industry Physics::Optics chemistry.chemical_element Spatial frequency business Superresolution Laser beams
Zdroj:	Imaging and Applied Optics 2019 (COSI, IS, MATH, pcAOP).
DOI:	10.1364/cosi.2019.jth3d.6
Popis:	Enhanced laser beam shaping for super-resolved imaging in silicon is demonstrated by applying pico-seconds pulsed pump at 775nm having increased penetration-depth into the silicon (than pump at 532nm) and yielding sharper PSF due to reduced diffusion effect of the generated free-charge-carriers.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::072419369f5aa92fbe2b744e36b00209 https://doi.org/10.1364/cosi.2019.jth3d.6 Zobrazit plný text záznamu