Stress and structural studies of ZnO thin films on polymer substrate under different RF powered conditions

Autor:	Yong-li Zang, Chuan-fu Cheng, Gong-xiang Wei, Xiao-Ling Fan, Jiao Li, Yun-yan Liu
Rok vydání:	2009
Předmět:	Materials science Mechanical Engineering Substrate (electronics) Sputter deposition Condensed Matter Physics Stress (mechanics) Mechanics of Materials Residual stress Stress relaxation Polymer substrate General Materials Science Radio frequency Thin film Composite material
Zdroj:	Materials Letters. 63:2597-2599
ISSN:	0167-577X
Popis:	The ZnO films are deposited on flexible substrate Teflon by radio frequency (RF) magnetron sputtering. The structure and residual stress of the films are revealed by XRD analysis. We find that the increase of RF power results in the change in the nature of stress and the difference of the grain size in the ZnO films on Teflon substrate. This indicates the possibility of the stress relaxation by increasing the RF power. Considering the (002) orientation and the mechanical stress, we suggest that the ZnO film deposited at RF power of 200 W for 1 h is optimal.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::06ccf6e25fc056cce8d2befacd907b51 https://doi.org/10.1016/j.matlet.2009.08.027 Zobrazit plný text záznamu Full Text from ScienceDirect