| Autor: |
Fang Liang, Luo Xiangang, Wang Jing-Quan, Du Jinglei, Zhang Zhi-You, Du Chunlei, Guo Xiao-Wei |
| Rok vydání: |
2008 |
| Předmět: |
|
| Zdroj: |
Chinese Physics B. 17:2499-2503 |
| ISSN: |
1674-1056 |
| DOI: |
10.1088/1674-1056/17/7/025 |
| Popis: |
The use of an attenuated total reflect ion-coup ling mode of prism coated with metal film to excite the interference of the surface plasmon polaritons (SPPs) was proposed for periodic patterning with a resolution of subwavelength scale. High intensity of electric field can be obtained because of the coupling between SPPs and evanescence under a resonance condition, which can reduce exposure time and improve contrast. In this paper, several critical parameters for maskless surface plasmon resonant lithography are described, and the preliminary simulation based on a finite difference time-domain technique agrees well with the theoretical analysis, which demonstrates this scheme and provides the theoretical basis for further experiments. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
|
