Fabrication of electrodes on charge–density–wave nanoscale crystals
| Autor: | Takeshi Toshima, Kazuhiko Yamaya, Satoshi Tanda, Katsuhiko Inagaki |
|---|---|
| Rok vydání: | 2005 |
| Předmět: |
Fabrication
Materials science Silicon Contact resistance Energy Engineering and Power Technology chemistry.chemical_element Nanotechnology Condensed Matter Physics Evaporation (deposition) Electronic Optical and Magnetic Materials chemistry Nanocrystal Electrode Electrical and Electronic Engineering Thin film Electron-beam lithography |
| Zdroj: | Physica C: Superconductivity and its Applications. :1736-1740 |
| ISSN: | 0921-4534 |
| DOI: | 10.1016/j.physc.2005.01.083 |
| Popis: | The reduction of the system size may lead to new developments in macroscopic quantum systems such as superconductors and charge–density–wave systems. In order to investigate such effects, thin films and thin wires are generally fabricated by an evaporation technique. However, this technique can only be applied to a limited number of materials; hence, a more versatile technique is required. In this study, we provide the results of our recent study on the fabrication of electrodes on nanoscale crystals. Gold electrodes, which were 400 nm in width, were fabricated by a standard lift-off technique on o -TaS 3 charge–density–wave nanocrystals, which were prepared by deposition on silicon substrates. The interface resistance was higher than 100 GΩ just after evaporation and was decreased significantly by electron beam irradiation. The electrodes were tested down to 80 mK and were found to be fairly durable for cryogenic measurement. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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