XeF* visible laser with selective optical excitation

Autor:	V M Nesterov, S V Shul'ga, B N Toleutaev, P. B. Sergeev, V. M. Buchnev, S A Pendyur, A. D. Klementov
Rok vydání:	1983
Předmět:	Materials science law Energy conversion efficiency General Engineering Atomic physics Radiation Laser Electromagnetic radiation Lasing threshold Dissociation (chemistry) Excitation law.invention Visible spectrum
Zdroj:	Soviet Journal of Quantum Electronics. 13:394-395
ISSN:	0049-1748
DOI:	10.1070/qe1983v013n03abeh004177
Popis:	The coefficient representing utilization of the electron beam energy (K ~2.3×10−3) in dissociation of XeF2 vapor was determined. This dissociation occurred under the action of selective radiation emitted from electron-beam-excited Xe2* dimers. Lasing was observed as a result of the C–A transition in the XeF* molecule (λ = 480 nm) and the output energy was 3.1 mJ.
Databáze:	OpenAIRE
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