Aging in Ferroelectric Si‐Doped Hafnium Oxide Thin Films

Autor:	Nico-Dominik Kohlenbach, Lukas M. Eng, Sophia Eßlinger, Tarek Ali, Malte Czernohorsky, Kati Kühnel, C. Mart, Wenke Weinreich
Rok vydání:	2021
Předmět:	Atomic layer deposition Materials science business.industry Si doped Optoelectronics General Materials Science Thin film Condensed Matter Physics business Ferroelectricity Hafnium oxide Pyroelectricity
Zdroj:	physica status solidi (RRL) – Rapid Research Letters. 15:2100023
ISSN:	1862-6270 1862-6254
DOI:	10.1002/pssr.202100023
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::0620d6a9501e7c99dc68f35f4b51d850 https://doi.org/10.1002/pssr.202100023 Zobrazit plný text záznamu Plný text