Chemical roles of peroxide-based alkaline slurries in chemical–mechanical polishing of Ta: investigation of surface reactions using time-resolved impedance spectroscopy

Autor:	K.A. Assiongbon, S.B. Emery, C.M. Pettit, Suryadevara V. Babu, Dipankar Roy
Rok vydání:	2004
Předmět:	chemistry.chemical_compound chemistry Chemical-mechanical planarization Inorganic chemistry Oxide General Materials Science Cyclic voltammetry Condensed Matter Physics Hydrogen peroxide Electrochemistry Peroxide Chemical reaction Dielectric spectroscopy
Zdroj:	Materials Chemistry and Physics. 86:347-357
ISSN:	0254-0584
DOI:	10.1016/j.matchemphys.2004.03.016
Popis:	This work presents an electrochemical investigation of chemical reactions kinetics in chemical–mechanical polishing of Ta in a peroxide-based alkaline medium. Time resolved Fourier transform electrochemical impedance spectroscopy is combined with cyclic voltammetry to probe the chemical roles of H2O2 and OH− in chemical–mechanical polishing. Competitive effects of electro-oxidation and oxide dissolution at a Ta disc electrode are studied in four different (nearly neutral, alkaline, peroxide-free and peroxide-containing) electrolytes. In alkaline peroxide solutions with pH≥10, surface catalyzed breakdown of interfacial H2O2 promotes certain reactions of oxide-removal from the Ta surface. These reactions are analyzed in detail. The results demonstrate how the detailed chemical aspects of the process, and kinetics of surface reactions in particular, can be probed in real time by using the method mentioned above.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::05f346f1aff4e8f7d24a5b712428c455 https://doi.org/10.1016/j.matchemphys.2004.03.016 Zobrazit plný text záznamu Full Text from ScienceDirect