The improved photosensitivity of photosensitive polyimides containing o ‐ nitrobenzyl ether groups induced by the addition of photoacid generator

Autor:	Youn-Jung Heo, Won Gun Koh, Geun Yeol Bae, Hyosun Lee, Gwang Sik Song, Kyung Ho Choi, Gyojic Shin, Jeong Ju Baek
Rok vydání:	2021
Předmět:	chemistry.chemical_compound Materials science Polymers and Plastics Photosensitivity chemistry Materials Chemistry Photoacid generator Ether Physical and Theoretical Chemistry Photochemistry Polyimide Micropatterning
Zdroj:	Journal of Polymer Science. 59:340-352
ISSN:	2642-4169 2642-4150
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::05eba99082e7e2eb8846f74759a040c0 https://doi.org/10.1002/pol.20200851 Zobrazit plný text záznamu Plný text