Synthesis of Highly Transparent SiCxNyOz:H Films via Plasma-Chemical Decomposition of 1,1,3,3,5,5-Hexamethylcyclotrisilazane, Oxygen, and Nitrogen Gas Mixture
| Autor: | E. A. Maksimovskiy, N. I. Fainer, M. N. Khomyakov, A. G. Plekhanov, V. R. Shayapov, I. V. Yushina |
|---|---|
| Rok vydání: | 2019 |
| Předmět: |
Silicon
medicine.diagnostic_test 010405 organic chemistry Analytical chemistry chemistry.chemical_element General Chemistry 010402 general chemistry 01 natural sciences Nitrogen Oxygen 0104 chemical sciences symbols.namesake chemistry Ellipsometry Spectrophotometry symbols medicine Spectroscopy Raman spectroscopy Chemical decomposition |
| Zdroj: | Russian Journal of General Chemistry. 89:2290-2294 |
| ISSN: | 1608-3350 1070-3632 |
| DOI: | 10.1134/s1070363219110203 |
| Popis: | Synthesis of silicon oxycarbonitride films highly transparent over a wide spectral region (350–2500 nm) has been developed. The films have been deposited during decomposition of 1,1,3,3,5,5-hexamethylcyclotrisilazane in mixtures with oxygen and nitrogen in a high-frequency discharge plasma in the temperature range of 373–973 K. The influence of the synthesis temperature and the oxygen to nitrogen ratio in the initial gas mixtures on chemical and functional properties of SiCxNyOz:H films has been studied using IR and Raman spectroscopy, energy-dispersive spectroscopy, ellipsometry, and spectrophotometry. The composition and selected characteristics of the obtained films have been investigated. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|