| Autor: |
Guy Davies, Peter van Oorschot, Gabrielle Kalmbach, Johannes Wangler, Richard Rogoff, Jan Mulkens, Jos de Klerk, Wolfgang Dr Rupp |
| Rok vydání: |
1996 |
| Předmět: |
|
| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| DOI: |
10.1117/12.240954 |
| Popis: |
This paper shows the suitabilily of i-line photolithography for production at 0.30 tm. The process performance is demonstrated through the use of off-axis illumination, high NA projection lens, and a state of the art photoresist system. The minimum required depth of focus for a suitable 0.30 tm process is derived as 0.95 tm over at least a 10% process window. This will result in a 0.60 m common corridor over a square 22 mm imaging feId. In addition to the dense and isolated lines, a preliminary investigation of contact hole performance using chrome and phase shift masks was completed. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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