| Autor: |
J. E. Bjorkholm, R. D'Souza, L. Eichner, R. R. Freeman, T. E. Jewell, A. A. MacDowell, W. M. Mansfield, J. Pastalan, L. H. Szeto, D. Taylor, D. M. Tennant, W. K. Waskiewicz, D. L. White, D. L. Windt, O. R. Wood |
| Rok vydání: |
1991 |
| Zdroj: |
Optical Society of America Annual Meeting. |
| DOI: |
10.1364/oam.1991.fb2 |
| Popis: |
Our group has undertaken a program to determine the feasibility of using soft x-rays (wavelengths of ~13 nm) to carry out advanced projection lithography. Such a technology is attractive since it would offer the ability to use reduction imaging to achieve a resolution of >0.1 µm while maintaining a depth of focus >1 µm. We have already demonstrated the printing over a small area of features as small as 50 nm using a 20×-reduction optical system composed of mirrors and synchrotron radiation from an undulator at the National Synchrotron Light Source. A review of our most recent results is presented. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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