Experimental study of the stability and reflective properties of depleted uranium thin films at a wavelength of 4.5 nm

Autor:	O. N. Gilev, A.L. Zapysov, A. V. Lipin, D. A. Vikhlyaev, V. I. Ostashev, A. V. Potapov, I. L. Svyatov, V. A. Pronin
Rok vydání:	2008
Předmět:	Fabrication Materials science Physics and Astronomy (miscellaneous) business.industry Carbon layer Wavelength Optics Depleted uranium Calibration Optoelectronics Thin film Reflection (computer graphics) business Radiant intensity
Zdroj:	Technical Physics. 53:1615-1618
ISSN:	1090-6525 1063-7842
DOI:	10.1134/s1063784208120141
Popis:	A technology of depleted uranium thin films, which can be used as high-reflectivity X-ray mirrors at a wavelength of 4.5 nm, is presented. The coefficient of X-ray reflection by these mirrors varies from 90 to 10% at grazing angles between 1° and 10°. The stability of the reflection coefficients for 200-A-thick depleted uranium films covered by a protective carbon layer 100 and 200 A in thickness and for 200-A-thick uranium-nickel films with a nickel content of 9 and 23 wt % is studied. A high-reflectivity mirror is fabricated with the goal of increasing the X-ray radiation intensity in RKK-1-100 X-ray calibration equipment. Advice on fabrication of X-ray mirrors based on depleted uranium films is given.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::05b7d82a59ed43505e36825cac2da599 https://doi.org/10.1134/s1063784208120141 Zobrazit plný text záznamu Plný text ve formátu PDF