Bombardment Damage in Reactively-Evaporated a-Si:H

Autor:	Masanari Shindo, Isao Myokan, Shigeru Mano, Shigeru Sato, Takuji Shibata
Rok vydání:	1985
Předmět:	Vacuum deposition Silicon Hydrogen Chemistry Impurity Inorganic chemistry General Engineering General Physics and Astronomy chemistry.chemical_element Irradiation Thin film Nuclear chemistry
Zdroj:	Japanese Journal of Applied Physics. 24:1100
ISSN:	1347-4065 0021-4922
DOI:	10.1143/jjap.24.1100
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::055d41d3b1ba8bbfe3aeeae21319bf4d https://doi.org/10.1143/jjap.24.1100 Zobrazit plný text záznamu