Alternative Technology for Creating Nanostructures Using Dip Pen Nanolithography
| Autor: | T. E. Smolyarova, A. V. Lukyanenko |
|---|---|
| Rok vydání: | 2018 |
| Předmět: |
010302 applied physics
chemistry.chemical_classification Alternative methods Nanostructure Materials science business.industry Nanotechnology 02 engineering and technology Polymer Substrate (printing) 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials Scanning probe microscopy chemistry Dip-pen nanolithography 0103 physical sciences Microelectronics 0210 nano-technology business Lithography |
| Zdroj: | Semiconductors. 52:636-638 |
| ISSN: | 1090-6479 1063-7826 |
| DOI: | 10.1134/s1063782618050202 |
| Popis: | For modern microelectronics, at the present time, the technologies of consciousness smart structures play an important role, which can provide accuracy, stability and high quality of the structures. Submicron lithography methods are quite expensive and have natural size limitations, not allowing the production of structures with an extremely small lateral limitation. Therefore, an intensive search was conducted for alternative methods for creating submicron resolution structures. Especially attractive one is the possibility of self-organization effects utilization, where the nanostructure of a certain size is formed under the influence of internal forces. The dip pen nanolithography method based on a scanning probe microscope uses a directwrite technology and allows one to carry out a playback of small size structures with high accuracy. In the experiment, a substrate coated with Au (15 nm) using a DPN technique is applied to the polymer to form a desired pattern nano-sized channel. The experiment was conducted using a pointed probe SiN, coated MHA-Acetonitrile, on the Si(111)/Fe3Si/Au structure. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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