Spectroscopic Analysis of Microwave-Generated Plasmas

Autor:	K. Hirsch, A. B. Ene, Andreas Schulz, M. Leins, R. Stirn, U. Schumacher, Matthias Walker, P. Lindner
Rok vydání:	2009
Předmět:	Nuclear and High Energy Physics Materials science Absorption spectroscopy Silicon chemistry.chemical_element Excitation temperature Condensed Matter Physics Spectral line chemistry Plasma diagnostics Stimulated emission Emission spectrum Atomic physics Spectroscopy
Zdroj:	IEEE Transactions on Plasma Science. 37:1836-1842
ISSN:	1939-9375 0093-3813
DOI:	10.1109/tps.2009.2026278
Popis:	Aiming at understanding and controlling the major mechanisms and processes in microwave-generated plasmas, the ground-state densities of the most relevant atomic species and their spatial distributions were determined in these plasmas. They can be measured by optical emission and absorption spectroscopy. Similar to the determination of the silicon ground-state density from the analysis of the self-absorbed spectral lines of the silicon ground-state multiplet 3p 23 P-3p4s 3 P 0 in the ultraviolet range at about 251 nm, the neutral concentrations of other species like carbon and titanium were evaluated from further spectroscopic analyses. Furthermore, the spatial distributions were explored in detail. New developments of microwave-generated plasma sources and their optical emission spectroscopy to investigate the kind of species in the plasmas, as well as the gas and excitation temperatures, are also presented.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::050d808f9d6dc1e8d3d5ed28db6131c8 https://doi.org/10.1109/tps.2009.2026278 Zobrazit plný text záznamu