Influence of current density on the physical properties of electroplated NiFeP nano thin films for MEMS applications

Autor: B. Mohanbabu, A. Kalaivani, R. Kannan, Donghui Guo, V. Sivakumar, G. Senguttuvan
Rok vydání: 2021
Předmět:
Zdroj: Journal of Materials Science: Materials in Electronics. 32:13610-13618
ISSN: 1573-482X
0957-4522
DOI: 10.1007/s10854-021-05939-x
Popis: Nanocrystalline thin films of NiFeP have been synthesized through electroplating technique on Copper substrate by varying the current densities from 5 to 20 mA/cm2 at constant bath temperature. The chemical composition of the NiFeP thin films and their corresponding surface features have been studied using energy dispersion X-ray analysis and scanning electron microscopy, respectively. Surface roughness was assessed using atomic force microscopic technique and X-ray diffraction (XRD) was used to study the nature and structure of the nano-crystalline material. The magnetic activity of NiFeP thin films was analyzed using a vibrating sample magnetometer (VSM). The surface analysis indicates that the coatings are smooth and free from cracks while the XRD data reveal the crystalline nature and the average crystalline dimensions of the nano thin films. The thickness of the NiFeP thin films measured at various current density values were observed to be in the range of 26–58 nm. VSM test shows higher magnetization values along with low coercivity for NiFeP thin films. A maximum saturation magnetization of 71.36 × 10–3 emu with a coercivity of 301 Gauss is also found to be exhibited by the NiFeP thin films that are coated at higher current densities. The adhesion of coated NiFeP thin films and their corresponding micro hardness have been also studied. Owing to their observed mechanical stability and magnetic nature, the prepared NiFeP thin films has a potential to be exploited for device applications for Micro-Electro-Mechanical Systems (MEMS).
Databáze: OpenAIRE
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