Threshold energy for the photon-stimulated desorption of Rb atoms from polydimethylsiloxane films

Autor:	J.H. Xu, G. Alzetta, F. Mango, R. A. Bernheim
Rok vydání:	2000
Předmět:	Photon Polydimethylsiloxane Analytical chemistry General Physics and Astronomy chemistry.chemical_element Threshold energy Intensity (physics) Rubidium chemistry.chemical_compound Adsorption chemistry Desorption Physical and Theoretical Chemistry Thin film
Zdroj:	Chemical Physics Letters. 332:1-4
ISSN:	0009-2614
DOI:	10.1016/s0009-2614(00)01238-0
Popis:	The laser frequency dependence of the photon-stimulated desorption (PSD) of Rb atoms from surfaces prepared by adsorption of rubidium vapor on thin films of polydimethylsiloxane (PDMS) was determined at low light intensities and at room temperature to have a threshold energy of 11 100 cm ˇ1 . The desorption of Rb follows the same functional dependence on laser frequency and intensity as that found for Na and Na2, where thresholds of 9500 and 11 500 cm ˇ1 were determined, respectively, and where a charge transfer model for the adsorbed species could successfully explain the 2000 cm ˇ1 diAerence in energy thresholds. ” 2000 Elsevier Science B.V. All rights reserved.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::04cdbf418241399f3b1cba3d3f21a7cc https://doi.org/10.1016/s0009-2614(00)01238-0 Zobrazit plný text záznamu Full Text from ScienceDirect