Autor: |
Fu Tsai Hwang, Ching-Ting Lee, Hsin Ying Lee, Tsung Hsin Lee |
Rok vydání: |
2007 |
Předmět: |
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Zdroj: |
Materials Science and Engineering: B. 136:92-95 |
ISSN: |
0921-5107 |
DOI: |
10.1016/j.mseb.2006.09.001 |
Popis: |
A RF magnetron sputter system was used to deposit lithium niobate (LiNbO 3 ) thin films on (1 1 1)-oriented Si substrates. An optimal sputtering condition with RF power of 100 W, Ar/O 2 ratio of 1 and substrate temperature of 575 °C was investigated. The smallest surface roughness of 6.0 nm for the deposited LiNbO 3 was measured using atomic force microscopy. The crystallinity was examined by low angle X-ray diffractometer. Using the SOPRA GES5 spectroscopic ellipsometer, the associated refractive index and extinction coefficient as a function of wavelength were measured. High optical performance with crystallinity structure of the deposited LiNbO 3 thin films was demonstrated. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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