Effect of Hot Isostatic Press Annealing for Ion-Implanted Silicon Carbide

Autor:	Yoshitaka Hirabayashi, Hideto Takano, Kiyoto Hirai, K. Yabuta, Mikito Kumagai, Masahiro Furuya
Rok vydání:	1998
Předmět:	chemistry.chemical_compound Ion implantation Materials science chemistry Mechanics of Materials Annealing (metallurgy) Mechanical Engineering High pressure Metallurgy Silicon carbide General Materials Science Condensed Matter Physics Ion
Zdroj:	Materials Science Forum. :749-752
ISSN:	1662-9752
DOI:	10.4028/www.scientific.net/msf.264-268.749
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::04b12f3c8812094000c4ba60ae7934b6 https://doi.org/10.4028/www.scientific.net/msf.264-268.749 Zobrazit plný text záznamu