| Autor: |
V. I. Yakovlev, A.A. Sitnikov, Anastasia A. Popova |
| Rok vydání: |
2021 |
| Předmět: |
|
| Zdroj: |
Defect and Diffusion Forum. 410:353-358 |
| ISSN: |
1662-9507 |
| DOI: |
10.4028/www.scientific.net/ddf.410.353 |
| Popis: |
The investigations of (Ti + Al)-SiO2 surfacing by magnetron deposition are presented in this article. The correlation between film`s thickness deposited on the particles by mechanocomposites and magnetron sputtering time was established. It was determined that the rational time for surfacing by Ti-Al mechanocomposites system is about 40 minutes. According that deposition time the thickness of deposited SiO2 films were obtained as 5.2 microns. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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