Pigmented Photoresist for Black Matrix
| Autor: | Takanori Kudo, Hiroshi Okazaki, Kazuya Nagao, Georg Pawlowski, Yuko Nozaki, Hidemasa Yamaguchi, Yuki Nanjo |
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| Rok vydání: | 1996 |
| Předmět: | |
| Zdroj: | Journal of Photopolymer Science and Technology. 9:121-130 |
| ISSN: | 1349-6336 0914-9244 |
| Popis: | A negative resist system composed of a phenolic resin, an azide, a crosslinker and a pigment dispersion has been developed for black matrix formation of color filters (CF). The novel pigmented photoresist (PPR), which consists of poly(4-hydroxystyrene), hexamethoxymethyl melamine, 4,4'diazidostilbene-2,2'-disulfonic-N,N-diethyleneoxyethylamide and a dispersion of carbon black combines superior opacity (OD = 3 . S tm 1), adequate resistance to solvents, acids and alkalis, good thermal stability, and film uniformity with excellent lithographic performance, such as high sensitivity (120 mJlcm2), high resolution ( |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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