Assisted Arf Excimer Photo-Etching Of Mercury Cadmium Telluride (MGT) Semiconductor

Autor:	Alain Azema, Philippe Gaucherel, Jean Botineau, Jean-Claude Roustan
Rok vydání:	1988
Předmět:	Inert Materials science Excimer laser business.industry medicine.medical_treatment Photoablation Excimer chemistry.chemical_compound Semiconductor chemistry Etching (microfabrication) medicine Optoelectronics Mercury cadmium telluride business Lithography
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.960212
Popis:	UV excimer etching could be an alternative method to classical lithography for the conversion of MOT planar waveguides into strip waveguides. Some preliminary results are given, which concern HgCdTe photoablation by ArF excimer laser emitting at 193 nm, under inert or chemically active surrounding gas conditions.
Databáze:	OpenAIRE
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