Full chip inverse lithography technology mask synthesis for advanced memory manufacturing

Autor:	Jennefir L. Digaum, Gary Chiang, Lin Wang, Kyle Braam, Dave Gerold, Yongdong Wang, Thuc Dam
Rok vydání:	2023
Zdroj:	DTCO and Computational Patterning II.
DOI:	10.1117/12.2657538
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::04078dbbc336cf656465c5de57cfa3a5 https://doi.org/10.1117/12.2657538 Zobrazit plný text záznamu