59Co nuclear magnetic resonance studies of interfacial defects in molecular beam epitaxy grown Co/Cu(111) multilayer

Autor:	P. C. Riedi, B. J. Hickey, T. Thomson, K. P. Wellock
Rok vydání:	1997
Předmět:	Surface diffusion Materials science Magnetoresistance Analytical chemistry General Physics and Astronomy chemistry.chemical_element Epitaxy Copper Nuclear magnetic resonance Planar chemistry Stack (abstract data type) Cobalt Molecular beam epitaxy
Zdroj:	Journal of Applied Physics. 81:4469-4471
ISSN:	1089-7550 0021-8979
DOI:	10.1063/1.364980
Popis:	59Co NMR and magnetotransport measurements have been undertaken on a series of molecular beam epitaxy grown Co 22 A/Cu 32 A(111) multilayers as a function of the number of repeat units in the multilayer stack. Examining the positions of the bulk [Co surrounded by 12 Co nearest neighbors (NN)] and ideal planar interface (Co surrounded by 9×Co and 3×Cu NN) lines showed that increasing the number of repeat units leads to greater strain in the Co layers indicating better epitaxial registry. Interfacial mixing was studied by examining the ratio of the relative signal strength of the bulk and ideal planar interface lines compared to the signal outside these regions. The relative intensity of the NMR signal outside the bulk and ideal interface lines clearly reduces as the number of repeat units is increased. This demonstrates that in these samples the interfacial quality improves as the number of repeat units is increased. Magnetotransport measurements show that the improvement in structural quality could be cor...
Databáze:	OpenAIRE
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