Micromachined Shear Stress Sensors for Characterization of Surface Forces During Chemical Mechanical Polishing

Autor:	Andrew Mueller, Sriram Anjur, Chris Rogers, Robert D. White, Mansour Moinpour, Vincent P. Manno
Rok vydání:	2007
Předmět:	Fabrication Materials science Deflection (engineering) Chemical-mechanical planarization Surface force Analytical chemistry Shear stress Polishing Composite material Microscale chemistry Contact force
Zdroj:	MRS Proceedings. 991
ISSN:	1946-4274 0272-9172
DOI:	10.1557/proc-0991-c06-03
Popis:	This paper describes the fabrication and calibration of micromachined shear stress sensors intended for characterization of the local pad-wafer contact forces present during chemical-mechanical polishing. Sensors consist of arrays of microfabricated poly-dimethyl-siloxane (PDMS) posts and are able to measure forces ranging from 2 to 200 μN. The posts are 100 μm high and have diameters of 40-100 μm. Calibrated post deflection sensitivities are linear and lie between 0.2 μm/μN and 1.3μm/μN. Sensor design, fabrication, and calibration are detailed. Feasibility is established for sensor integration into a CMP scale model test setup, including an optical viewing method for observing post deflection during polishing. Initial micrographs of post deflection during polishing do not yet have sufficient resolution to determine the microscale forces during polishing.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::03618948204ae1b3d96e271c4c0dbd69 https://doi.org/10.1557/proc-0991-c06-03 Zobrazit plný text záznamu Full text from SpringerLink