Thermal plasma CVD of PSZ and double layered TiN/PSZ coatings by injection of alkoxides solutions with H2O
| Autor: | T. Furuta, Jiro Tsujino, Shiro Shimada, Isao Yamazaki |
|---|---|
| Rok vydání: | 2008 |
| Předmět: |
Zirconium
Materials science Scanning electron microscope Metallurgy chemistry.chemical_element Surfaces and Interfaces General Chemistry Yttrium Chemical vapor deposition Condensed Matter Physics Titanium nitride Surfaces Coatings and Films chemistry.chemical_compound chemistry Chemical engineering X-ray photoelectron spectroscopy Materials Chemistry Tin Titanium |
| Zdroj: | Surface and Coatings Technology. 202:4644-4652 |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/j.surfcoat.2008.03.035 |
| Popis: | Coatings of partially Y 2 O 3 -stabilized ZrO 2 (PSZ) (Y > 2 at.%) and double layered TiN/PSZ films were deposited on Si wafers at 700 °C from zirconium tetra-buthoxide (ZTBO), yttrium tri-buthoxide (YTBO) and/or titanium tetra-ethoxide by chemical vapor deposition with H 2 O in a thermal Ar/N 2 /H 2 plasma. A small amount of H 2 O was fed into the plasma to oxidize the ZTBO and YTBO to produce the PSZ coatings. Double layered TiN/PSZ film coatings were deposited without severe oxidation of under-layered TiN by controlling the feeding rate of H 2 O. The product phases were identified by grazing incidence X-ray-diffractometry. The surfaces and cross-sections of the PSZ and double layered TiN/PSZ coatings were observed by scanning electron microscopy. An in-depth semi-quantitative analysis of the double layered TiN/PSZ films was performed by X-ray photoelectron spectroscopy, revealing the changes in the concentrations of Zr, Y, Ti, O, and N with depth. The effect of the Y content in mixed solutions of ZTBO and YTBO on the evolution of ZrO 2 is examined. It is proposed that the controlled feed rate of H 2 O is effective in producing coatings of PSZ on TiN films without severe oxidation. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect