New Photosensitive Polyimide Materials and Their Application to Low-loss Optical Waveguides

Autor:	Amane Mochizuki, Kazunori Mune, Takahiro Fukuoka, Kenichi Tagawa, Ryuusuke Naitou
Rok vydání:	2003
Předmět:	Materials science Fabrication Polymers and Plastics business.industry Organic Chemistry Photoresist Waveguide (optics) Core (optical fiber) Negative type Optical propagation Optics Materials Chemistry Optoelectronics business Polyimide
Zdroj:	Journal of Photopolymer Science and Technology. 16:243-246
ISSN:	1349-6336 0914-9244
DOI:	10.2494/photopolymer.16.243
Popis:	A negative-working photosensitive polyimide-precursor (PSPI-precursor) for optical waveguide based on a poly(amic acid) (PAA) and 1, 4-dihydropyridine derivatives (DHP)s has been developed. The PAA was prepared by ring-opening polyaddition of aromatic fluorinated tetracarboxylic dianhydrides and diamines. The PSPI-precursor was capable to resolve a 2-μm width pattern when a 10 μm-thick film was used. Fabrication of optical waveguides by a simple patterning process using the PSPI is also described. PSPI is directly patterned by UV exposure and wet chemical development, avoiding use of photoresist. By using the standard cut back method, optical propagation losses were found to be as low as 0.4 dB/cm at 1.55 μm.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::03272c201d1e86b2563f13c35ee79d9b https://doi.org/10.2494/photopolymer.16.243 Zobrazit plný text záznamu