Prospects for development of the projection X-ray photolithographic technology
Autor: | K. M. Krymskii, M. I. Krymskii, S. M. Aranchii, V. E. Rogalin |
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Rok vydání: | 2015 |
Předmět: | |
Zdroj: | Journal of Communications Technology and Electronics. 60:308-310 |
ISSN: | 1555-6557 1064-2269 |
DOI: | 10.1134/s1064226915030031 |
Popis: | Practical prospects for the implementation of the projection X-ray photolithographic technology in the wavelength interval 3–30 nm based on a combination of the CO2-laser plasma and multilayer X-ray reflectors is analyzed. It is demonstrated that the stable work of the CO2 laser with a power of several tens of kilowatts necessitates the application of a cooled polycrystalline diamond window between the active medium and atmosphere. Practical recommendations for the construction of the high-reflection coatings for the soft X-ray radiation based on the extension of the set of material layers are proposed. |
Databáze: | OpenAIRE |
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