Prospects for development of the projection X-ray photolithographic technology

Autor: K. M. Krymskii, M. I. Krymskii, S. M. Aranchii, V. E. Rogalin
Rok vydání: 2015
Předmět:
Zdroj: Journal of Communications Technology and Electronics. 60:308-310
ISSN: 1555-6557
1064-2269
DOI: 10.1134/s1064226915030031
Popis: Practical prospects for the implementation of the projection X-ray photolithographic technology in the wavelength interval 3–30 nm based on a combination of the CO2-laser plasma and multilayer X-ray reflectors is analyzed. It is demonstrated that the stable work of the CO2 laser with a power of several tens of kilowatts necessitates the application of a cooled polycrystalline diamond window between the active medium and atmosphere. Practical recommendations for the construction of the high-reflection coatings for the soft X-ray radiation based on the extension of the set of material layers are proposed.
Databáze: OpenAIRE