| Popis: |
Single-doped TiO2/FTO and co-doped TiO2-VO2/FTO thin films were prepared by sonochemistry and spray pyrolysis deposition on FTO substrates. The co-deposition of TiO2-VO2 on FTO significantly changed the morphological, structural, optical, and photocatalytical properties compared to the single-deposition. X-ray diffraction and HRTEM results showed polycrystalline film structures composed of SnO2-tetragonal from FTO, anatase-TiO2, rutile-TiO2, and monoclinic-VO2 phases. The co-deposition technique increases the particle size distribution by approximately two times compared to simple deposition. The single-doped TiO2/FTO thin film had a 15% higher bandgap than the co-doped TiO2-VO2/FTO thin film, and the electrical resistivity calculated from the van der Pauw method was 55.3 MΩ sq−1 for the TiO2-VO2/FTO co-doped thin film, 2.7 times lower than that obtained for the TiO2/FTO thin film. Single-doped TiO2/FTO and co-doped TiO2-VO2/FTO thin films presented pseudo-first-order reactions at pH 6.5, with kinetic constants of 0.026 and 0.015 min−1, respectively. This behavior is related to the production of inactive or less active aggregates by the addition of vanadium during the co-doping process, which led to lattice contraction, which encouraged the formation of the rutile phase rather than the anatase phase. However, the co-doped thin film can modify the metal-insulator transition compared to the single-doped TiO2/FTO thin film. Furthermore, co-deposition decreased the bandgap value by 16% compared to single-deposition thin film. In this sense, co-doped TiO2-VO2/FTO thin films inhibited the recombination of photogenerated carriers and the formation of reactive oxygen species involved in the photocatalytic degradation of naproxen. |
