Tribological behavior of TiN films depositid by reactive magnetron sputtering under low pressure
| Autor: | S. N. Melnikov, D. A. Golosov, M. V. Ermolenko, E. G. Zamburg, S. M. Zavadski |
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| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
Materials science Metallurgy chemistry.chemical_element 02 engineering and technology Sputter deposition Tribology 01 natural sciences Titanium nitride Surfaces Coatings and Films Volumetric flow rate chemistry.chemical_compound 020303 mechanical engineering & transports 0203 mechanical engineering chemistry Mechanics of Materials Sputtering 0103 physical sciences Deposition (phase transition) Thin film Tin human activities |
| Zdroj: | Journal of Friction and Wear. 37:289-292 |
| ISSN: | 1934-9386 1068-3666 |
| DOI: | 10.3103/s1068366616030065 |
| Popis: | The effect of deposition conditions on the tribological behavior of titanium nitride thin films produced by reactive magnetron sputtering has been studied. Dependences of the hardness, the width of the friction track, the friction coefficient, and the volume wear of the TiN films on the N2 reactive gas flow rate have been obtained. Conditions of deposition under which the coatings with the best tribological characteristics are formed have been determined. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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