| Autor: |
L.A. Larson |
| Rok vydání: |
1991 |
| Předmět: |
|
| Zdroj: |
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 55:132-136 |
| ISSN: |
0168-583X |
| DOI: |
10.1016/0168-583x(91)96149-f |
| Popis: |
This paper is a review of current work to improve particulate control in ion implantation equipment. The first section includes current published research work which will be outlined and summarized. The second section focusses on work performed at National Semiconductor Corporation on testing and implementing an in situ particle monitoring system. The first equipment test consisted of a single monitor mounted in a medium current implanter. This test indicated that the particle signal correlated to surface scan monitor tests and that operating characteristics of the ion implanters which produce particles were observable. Our followup effort was an implementation of the in situ counters on all the implanters as a single particle counting system for the fab. The result of this work was a pareto-like analysis of machine and process issues which result in particle events. A correlation of lot-specific particle counts to yield was also developed. The advances in machine particulate control are contrasted with the needs and trends in process development. Although the advances in particulate control have been excellent, the predicted future requirements are even more stringent. The implications of these needs on both particulate performance and measurement are discussed. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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