Silicon Trench Etching by Electron Cyclotron Resonance Plasma

Autor:	Takashi Tsutsumi, Muneo Furuse, Kazuo Takata, Yutaka Enta
Rok vydání:	2010
Předmět:	Materials science General Materials Science Surfaces and Interfaces Instrumentation Spectroscopy
Zdroj:	Journal of the Vacuum Society of Japan. 53:435-440
ISSN:	1882-4749 1882-2398
DOI:	10.3131/jvsj2.53.435
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::02d132f922c041f1d0a5a69efb2b0a9c https://doi.org/10.3131/jvsj2.53.435 Zobrazit plný text záznamu