Direct current and high power impulse magnetron sputtering discharges with a positively biased anode

Autor:	Rainer Hippler, Zdenek Hubicka, Martin Cada
Rok vydání:	2021
Předmět:	Materials science Direct current Surfaces and Interfaces Plasma Sputter deposition Condensed Matter Physics Surfaces Coatings and Films Anode Ion symbols.namesake Cavity magnetron symbols Langmuir probe High-power impulse magnetron sputtering Atomic physics
Zdroj:	Journal of Vacuum Science & Technology A. 39:043007
ISSN:	1520-8559 0734-2101
Popis:	A magnetron sputtering discharge with a positively biased anode in argon gas is investigated by Langmuir probe diagnostics and by energy-resolved mass spectrometry. The discharge is operated in continuous (direct current) and in pulsed (high power impulse magnetron sputtering, Hi) mode with a Ti target and in Ar gas. Singly-charged Ar +, Ti +, and Ar 2 + and doubly-charged Ar 2 + and Ti 2 + ions are observed. A novel approach is to bias the magnetron anode. Application of a positive anode voltage shifts the kinetic energies of plasma ions by q e 0 V a, where V a is the anode voltage and q e 0 is the ion charge. It allows for an effective control of plasma ion energies.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::02500d92d84fbc15180d88d337946616 https://doi.org/10.1116/6.0001054 Zobrazit plný text záznamu