Effects of assisting and sputtering ion current on ion beam assisted deposition textured yttria stabilized zirconia buffer layers of coated conductors
| Autor: | Feng Feng, Zhi Wang, Zhi-Ping Zhao, Zhaotan Jiang, B.J. Yan, Haosheng Chen, Y.L. Li, K. Shi, Z. Han |
|---|---|
| Rok vydání: | 2010 |
| Předmět: |
Materials science
General Physics and Astronomy Ion current Surfaces and Interfaces General Chemistry Condensed Matter Physics Surfaces Coatings and Films Ion Sputtering Deposition (phase transition) Texture (crystalline) Composite material Thin film Ion beam-assisted deposition Yttria-stabilized zirconia |
| Zdroj: | Applied Surface Science. 257:1769-1773 |
| ISSN: | 0169-4332 |
| DOI: | 10.1016/j.apsusc.2010.09.013 |
| Popis: | Biaxially textured yttria stabilized zirconia (0 0 1) thin films were fabricated on untextured hastelloy substrates by ion beam assisted deposition method. The effects of assisting beam current density Ja and sputtering beam current density Js on the textures of the films were studied. The results indicate that as Ja or Js increase, both the out-of-plane and the in-plane textures are improved initially, and then degrade. The results can be attributed to anisotropic damage and selective sputtering effect of assisting ions. At the same ion-to-atom arrival ratio r, which is reflected with Ja/Js value, lower deposition rate can enhance the biaxial texture. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect