Investigation of Supercritical Fluid Treatment for SiN/SiON/AlGaN/GaN MIS-HEMTs
Autor: | Xinnan Lin, Shuhao Xiong |
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Rok vydání: | 2020 |
Předmět: | |
Zdroj: | 2020 IEEE 3rd International Conference on Electronics Technology (ICET). |
DOI: | 10.1109/icet49382.2020.9119650 |
Popis: | Supercritical fluid treatment technology is introduced to MIS-HEMTs with Si-N related dielectric layers. The high resolution micrographs as well as energy spectrum distribution are analyzed before and after the supercritical fluid treatment. The technology effectively passivates the dielectric/III-V interfaces and improve the quality of the dielectrics. A molecular-level reaction mode was proposed to explain the positive shift of threshold voltage of ~2.5V as well as the increased maximum drain current by ~25%, increased maximum transconductance by ~34% and reduced off-state drain current by orders of magnitude. All the results reveal the potential of supercritical fluid treatment to be applied to GaN-based power switching applications as batching processing in low temperature. |
Databáze: | OpenAIRE |
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