Microstructure and orientation effects in diamond thin films

Autor:	J. F. DeNatale, John F. Flintoff, A. B. Harker
Rok vydání:	1991
Předmět:	Materials science fungi food and beverages General Physics and Astronomy Diamond Mineralogy Crystal growth Chemical vapor deposition Substrate (electronics) engineering.material Microstructure Epitaxy Carbon film engineering Thin film Composite material
Zdroj:	Journal of Applied Physics. 69:6456-6460
ISSN:	1089-7550 0021-8979
DOI:	10.1063/1.348851
Popis:	The microstructure and orientation of diamond thin films grown by plasma assisted chemical vapor deposition have been studied as functions of growth temperature, substrate identity, and substrate pre‐treatment. Results indicate that for growth temperatures below 650 °C, competition between film growth and etching can lead to preferential (110) oriented films on a variety of substrate materials. This orientation can be globally sustained during growth by the occurrence of (111) planar defects.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::01a092949c3fb4fc8dbcee4991dd9ee8 https://doi.org/10.1063/1.348851 Zobrazit plný text záznamu