Autor: |
Kunikaza Izumi, Isaho Kamata, Toshiyuki Miyanagi, Tomonori Nakamura, Hidekazu Tsuchida, Tamotsu Jikimoto |
Rok vydání: |
2005 |
Předmět: |
|
Zdroj: |
Materials Science Forum. :721-724 |
ISSN: |
1662-9752 |
DOI: |
10.4028/www.scientific.net/msf.483-485.721 |
Popis: |
We investigated the effect of high temperature annealing on the Schottky barrier height (Fb) and the ideality factor (n-factor) of a Mo contact. In a Mo contact, the Fb increased and the leakage current decreased by annealing at 600oC, while no increase in n-factor and forward excess current owing to the high temperature annealing was observed. The Schottky barrier diode with Mo contact annealed at 600oC showed a blocking-voltage (Vb) of 4.15 kV and a specific on resistance (Ron) of 9.07 mWcm2, achieving a high Vb 2/Ron value of 1898 MW/cm2. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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