A new lithography technique using super-resolution near-field structure
| Autor: | Masashi Kuwahara, Nobufumi Atoda, Takashi Nakano, M. B. Lee, Junji Tominaga |
|---|---|
| Rok vydání: | 2000 |
| Předmět: |
Diffraction
Chemistry business.industry Near and far field Photoresist Condensed Matter Physics Superresolution Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Laser linewidth Optics X-ray lithography Electrical and Electronic Engineering business Lithography Laser beams |
| Zdroj: | Microelectronic Engineering. 53:535-538 |
| ISSN: | 0167-9317 |
| Popis: | We have succeeded in fabricating narrow grooves in a photoresist film by a new lithography technique using an optical near-field with 365nm and 440nm light sources. This technique makes use of super-resolution near-field structure (Super-RENS) which is composed of multilayres to convert a focused laser beam to optical near-field. By this technique, grooves with linewidth of 100-nm-order could be produced beyond diffraction limit at high speed. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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