| Autor: |
I. Sh. Nevliudov, D. V. Gurin, V. N. Gurin, K. L. Khrustalev |
| Jazyk: |
ruština |
| Rok vydání: |
2019 |
| Předmět: |
|
| Zdroj: |
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, Vol 0, Iss 8, Pp 93-100 (2019) |
| ISSN: |
1729-7648 |
| Popis: |
The article investigates a low-temperature plasma of the magnetron discharge of a device used for the synthesis of dielectric films by reactive cathode sputtering. The aim of the study is to determine the temperature characteristics of plasma particles and a sputtered substance, as well as the mechanism for the formation of a chemical bond between sputtered atoms and active gas molecules. A study of the composition and energy parameters of the plasma, as well as the chemical composition of the particles obtained by sputtering, was carried out by a spectroscopic method. The quantitative composition was determined by a mass spectrometer to determine the composition of the sputtered particles. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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