High-speed spatial atomic-layer deposition of aluminum oxide layers for solar cell passivation

Autor:	Poodt, P.W.G., Lankhorst, A.M., Roozeboom, F., Spee, C.I.M.A., Maas, D., Vermeer, A.
Přispěvatelé:	TNO Industrie en Techniek
Jazyk:	angličtina
Rok vydání:	2010
Předmět:	Solar cells TS - Technical Sciences Cell surfaces Atomic layer deposition Mechatronics Mechanics & Materials High-speed Cell membranes Passivation TFT - Thin Film Technology Aluminum oxides Recombination velocity Aluminum coatings Electronics
Zdroj:	Advanced Materials, 32, 22, 3564-3567
Popis:	In this Communication we show that with spatially separated ALD of Al2O3 growth rates of 1.2 nm s-1 can be achievd, showing excellent surface passivation (surface recombination velocities of
Databáze:	OpenAIRE
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