Full metal gate with borderless contact for 14 nm and beyond

Autor:	Seo, S. -C, Edge, L. F., Kanakasabapathy, S., Martin Frank, Inada, A., Adam, L., Wang, M. M., Watanabe, K., Jamison, P., Ariyoshi, K., Sankarapandian, M., Fan, S., Horak, D., Li, J. T., Vo, T., Haran, B., Bruley, J., Hopstaken, M., Brown, S. L., Chang, J., Cartier, E. A., Park, D. -G, Stathis, J. H., Doris, B., Divakaruni, R., Khare, M., Narayanan, V., Paruchuri, V. K.
Zdroj:	Scopus-Elsevier
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::adcc9c0802a46e8719d335d83a5fb489 http://www.scopus.com/inward/record.url?eid=2-s2.0-80052672263&partnerID=MN8TOARS Zobrazit plný text záznamu