Atomic layer deposition of HfO2 thin films and nanolayered HfO2-Al2O3-Nb2O5 dielectrics

Autor:	Kaupo Kukli, Mikko Ritala, Markku Antero Leskelä, Timo Sajavaara, Juhani Keinonen, Gilmer, David C., Rama Hegde, Raghaw Rai, Lata Prabhu
Zdroj:	University of Helsinki
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::a4dca76379cda26976b71f5075f85a00 https://researchportal.helsinki.fi/en/publications/5add46d0-c80b-42e8-90e6-d23f5f08ac10 Zobrazit plný text záznamu