An expanding plasma process for thin metal films nitriding : reactivity and structure of the surface correlated to microwave plasma parameters

Autor: Jauberteau, Isabelle, Goudeau, P., Jauberteau, Jean-Louis, Soulestin, Bernard, Marteau, M., Cahoreau, M., Aubreton, Jacques
Přispěvatelé: Axe 2 : procédés de traitements de surface, Science des Procédés Céramiques et de Traitements de Surface (SPCTS), Université de Limoges (UNILIM)-Ecole Nationale Supérieure de Céramique Industrielle (ENSCI)-Institut des Procédés Appliqués aux Matériaux (IPAM), Université de Limoges (UNILIM)-Université de Limoges (UNILIM)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université de Limoges (UNILIM)-Ecole Nationale Supérieure de Céramique Industrielle (ENSCI)-Institut des Procédés Appliqués aux Matériaux (IPAM), Université de Limoges (UNILIM)-Université de Limoges (UNILIM)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Laboratoire de métallurgie physique (LMP), Centre National de la Recherche Scientifique (CNRS)-Université de Poitiers, Segear, Martine
Jazyk: angličtina
Rok vydání: 2007
Předmět:
Zdroj: Physical and Chemical News
Physical and Chemical News, Best Edition, 2007, 36, pp.102-108
ISSN: 1114-3800
Popis: International audience; The reactivity of molybdenum surface heated at temperatures as low as 673 K and exposed to (Ar-N2-H2) expanded microwave plasma is explained by the formation of a large amount of defects where nitrogen species pile up before diffusing in the metal. This effect is caused by the impact of the impinging active gaseous species such as ions and simple radicals on the molybdenum surface. Moreover, in contrast to binary gas mixtures, the plasma is stable and expands to long distance in ternary gas mixture containing large concentration of N2 and H2. Investigation means such as secondary ion mass spectrometry (SIMS), X-ray photoelectron spectroscopy, X-ray diffraction and transmission electron spectroscopy (TEM) are carried out to determine the composition, the crystallographic and morphologic structure of the molybdenum films after nitriding. (Ar-25%N2-30%H2) and (Ar-8%N2-10%H2) plasma exposures of thin molybdenum films up to 600 nm thick and heated at 873 K lead to nitrogen diffusion into the whole film thickness. A nitride compound of tetragonal-like bMo2N structure has formed whereas a low amount of pure bcc Mo phase is detected. The film consists of small columnar grains ranging in size from 20 nm to 30 nm in the growth direction.
Databáze: OpenAIRE
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