Impact of Atomic Layer Deposition Chemistry to the Quality of High-Permittivity Metal Oxide Thin Solid Films

Autor:	Kaupo Kukli, Mikko Ritala, Markku Antero Leskelä
Zdroj:	University of Helsinki
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::92d7c623643ce89966db9576b4999231 https://researchportal.helsinki.fi/en/publications/9dea623f-ffe6-481c-b4df-b082522b08cf Zobrazit plný text záznamu