EFFECT OF DEPOSITION PARAMETERS ON THE SUPERHARDNESS AND STOICHIOMETRY OF NANOSTRUCTURED Ti-Hf-Si-N FILMS
| Autor: | Pogrebnyak, A. D., Beresnev, V. M., Shpak, A. P., Konarskii, P., Komarov, F. F., Kirik, G. V., Makhmudov, N. A., Kolesnikov, D. A., Uglov, V. V., Sobol, O. V., Kaverin, M. V., Grudnitskii, V. V. |
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| Zdroj: | CIÊNCIAVITAE ResearcherID |
| Databáze: | OpenAIRE |
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