Ultra-thin strained SOI substrate analysis by pseudo-MOS measurements

Autor:	Gallon C. Fenouillet-Béranger N. Bresson S. Cristoloveanu F. Allibert S. Bord C. Aulnette D. Delille E. Latu-Romain J.M. Hartmann T. Ernst F. Andrieu Y. Campidelli B. Ghyselen I. Cayrefourcq F. Fournel N. Kernevez T. Skotnicki, C.
Přispěvatelé:	Domenget, Chahla, Institut de Microélectronique, Electromagnétisme et Photonique (IMEP), Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique de Grenoble (INPG)-Université Joseph Fourier - Grenoble 1 (UJF), Université Joseph Fourier - Grenoble 1 (UJF)-Institut National Polytechnique de Grenoble (INPG)-Centre National de la Recherche Scientifique (CNRS)
Jazyk:	angličtina
Rok vydání:	2005
Předmět:	[SPI.ELEC]Engineering Sciences [physics]/Electromagnetism [INFO.INFO-TS]Computer Science [cs]/Signal and Image Processing [INFO.INFO-TS] Computer Science [cs]/Signal and Image Processing [SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics [SPI.ELEC] Engineering Sciences [physics]/Electromagnetism [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics [SPI.SIGNAL]Engineering Sciences [physics]/Signal and Image processing ComputingMilieux_MISCELLANEOUS [SPI.SIGNAL] Engineering Sciences [physics]/Signal and Image processing
Zdroj:	Microelectronic Engineering Microelectronic Engineering, Elsevier, 2005, 80, pp.241-244 14th Biennial Conf. on Insulating Films On Semiconductors (INFOS'05) 14th Biennial Conf. on Insulating Films On Semiconductors (INFOS'05), 2005, XX, pp.XX
ISSN:	0167-9317 1873-5568
Popis:	International audience
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::675436383200075c5699f7867b6b4c95 https://hal.archives-ouvertes.fr/hal-00146221 Zobrazit plný text záznamu Full Text from ScienceDirect