| Autor: |
Soer, W., Herpen, van, M., Gielissen, K., Banine, V.Y. |
| Přispěvatelé: |
Elementary Processes in Gas Discharges, Plasma & Materials Processing |
| Jazyk: |
angličtina |
| Rok vydání: |
2007 |
| Popis: |
Introduction Problem Sn-based EUV sources generate Sn debris that contaminates nearby EUV mirrors and thus reduces their reflectivity. Solution Liquid EUV mirrors: grazingincidence mirrors with a liquid metal or alloy surface. The liquid surface absorbs incoming Sn debris while maintaining a low surface roughness and hence a high EUV reflectivity. Applications Dose sensors, reflective debris mitigation tools (e.g. reflective foil trap) and debris-resistant collector optics. Objectives • Measure reflectivity of EUV radiation and ionic Sn debris on liquid metal surface. • Obtain good wetting of liquid metal on metal substrates to enable tilting of the liquid mirror into arbitrary orientation while maintaining a low surface roughness. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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